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Sputtering targets and sputtering equipment

May. 20, 2024

Sputtering targets and sputtering equipment

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WE MANUFACTURE SPUTTERING TARGETS IN ALL MATERIALS AND SHAPES

Sputtering is the future of surface coating, and FHR is at the forefront regarding this technology. Our team of experts is constantly working to develop innovative solutions that increase your productivity and reduce costs. Our sputtering technology is leading in terms of efficiency and precision.

Our high-quality sputtering targets and innovative sputtering technology set standards in surface coating.

Tantalum Arsenide Sputtering Target Powder | Low Price $1

Product Name

Tantalum Arsenide Sputtering Target Powder

CAS No.

N/A

Appearance

Powder                       

Purity

≥99.9%           

APS

1-5µM (Can be customized)

Acetron contains other products and information you need, so please check it out.

Ingredient

Ta-As

Product Code

NCZ-AE-463/21

Tantalum Arsenide Sputtering Target Powder Description

Nanochemazone specializes in producing high purity Tantalum Arsenide (Arsenic-Tantalum) Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard sputtering targets for thin film deposition are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large-area coating for solar energy or fuel cells and flip-chip applications. 

All targets are analyzed using best-demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). Materials are produced using crystallization, solid-state, and other ultra-high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. 

Tantalum Arsenide Sputtering Target Related Information:

Storage Conditions:

Airtight sealed, avoid light and keep dry at room temperature.

Please contact us for customization and price inquiry

Email: contact@nanochemazone.com

Note: We supply different size ranges of Nano and micron as per the client’s requirements and also accept customization in various parameters.

Want more information on sputtering target materials? Feel free to contact us.

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