Rotary Metal Sputtering Targets - Acetron

High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.% for some metals. Also have controlled specific impurities within the target

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High density: Metal targets have high density characteristics, usually up to 99%, to ensure the stability and quality of materials.

Uniform grain: Controlled grain size and direction

Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality.

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Rotary sputtering targets, often referred to as rotary targets or rotatable sputtering targets, are increasingly used in magnetron sputtering systems for enhanced efficiency and uniformity. A rotary sputter target, due to its cylindrical design, allows for better material utilization compared to traditional planar targets. Rotatable targets are particularly beneficial in large-scale production, where consistent coating quality is essential.

Acetron, founded in , specializes in leading-edge PVD coating materials, providing highly pure materials for the most demanding coating processes. With over 20 years of experience, we focus on optimizing PVD technology, which is recognized as a sustainable solution that significantly reduces CO2 emissions. Our products, including sputtering targets and evaporation materials, serve diverse industries such as optics, automotive, energy, and medical applications, supporting OEM/ODM needs with accurate tolerances and stable quality. Our commitment to excellence is backed by certifications from our in-house laboratory and international authorities, including ISO, IATF, ISO, and ISO. We utilize advanced equipment like SEM, GDMS, and vacuum technology, and we have developed a large automatic bonding production line for sputtering targets, reinforcing our position as a leader in the coating materials industry.